DOI: 10.1016/j.watres.2018.06.062
Scopus记录号: 2-s2.0-85049346782
论文题名: Solar photo-Fenton disinfection of 11 antibiotic-resistant bacteria (ARB) and elimination of representative AR genes. Evidence that antibiotic resistance does not imply resistance to oxidative treatment
作者: Giannakis S. ; Le T.-T.M. ; Entenza J.M. ; Pulgarin C.
刊名: Water Research
ISSN: 431354
出版年: 2018
卷: 143 起始页码: 334
结束页码: 345
语种: 英语
英文关键词: Advanced oxidation process (AOPs)
; Antibiotic resistance
; Photo-Fenton
; Solar disinfection (SODIS)
; Water treatment
Scopus关键词: Antibiotics
; Disinfection
; Drug therapy
; Escherichia coli
; Genes
; Health risks
; Oxidation
; Wastewater treatment
; Water treatment
; Advanced oxidation process
; Antibiotic resistance
; Antibiotic-resistant bacteria
; Klebsiella pneumoniae
; Oxidative treatment
; Photo-Fenton
; Solar disinfection
; Staphylococcus aureus
; Image processing
; antibiotic resistance
; bacterium
; disinfection
; experimental study
; gene
; oxidation
; solar radiation
; water treatment
; advanced oxidation process
; antibiotic resistance
; antibiotic resistant bacteria
; antibiotic sensitivity
; Article
; bacterial gene
; bacterial growth
; bacterial strain
; bacterial structures
; bacterium
; controlled study
; disinfection
; Escherichia coli
; Gram negative bacterium
; Gram positive bacterium
; Klebsiella pneumoniae
; light
; nonhuman
; oxidation
; priority journal
; solar light disinfection
; solar photo Fenton method
; Staphylococcus aureus
; Bacteria (microorganisms)
; Escherichia coli
; Klebsiella pneumoniae
; Negibacteria
; Posibacteria
; Staphylococcus aureus
英文摘要: The emergence of antibiotic resistance represents a major threat to human health. In this work we investigated the elimination of antibiotic resistant bacteria (ARB) by solar light and solar photo-Fenton processes. As such, we have designed an experimental plan in which several bacterial strains (Staphylococcus aureus, Escherichia coli and Klebsiella pneumoniae) possessing different drug-susceptible and -resistant patterns and structures (Gram-positive and Gram-negative) were subjected to solar light and the photo-Fenton oxidative treatment in water. We showed that both solar light and solar photo-Fenton processes were effective in the elimination of ARB in water and that the time necessary for solar light disinfection and solar photo-Fenton disinfection were similar for antibiotic-susceptible and antibiotic-resistant strains (mostly 180–240 and 90–120 min, respectively). Moreover, the bacterial structure did not significantly affect the effectiveness of the treatment. Similar regrowth pattern was observed (compared to the susceptible strain) and no development of bacteria with higher drug-resistance values was found in waters after any treatment. Finally, both processes were effective to reduce AR genes (ARGs), although solar photo-Fenton was more rapid than solar light. In conclusion, the solar photo-Fenton process ensured effective disinfection of ARB and elimination of ARGs in water (or wastewater) and is a potential mean to ensure limitation of ARB and ARG spread in nature. © 2018 Citation statistics:
资源类型: 期刊论文
标识符: http://119.78.100.158/handle/2HF3EXSE/112577
Appears in Collections: 气候减缓与适应
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作者单位: School of Basic Sciences (SB), Institute of Chemical Science and Engineering (ISIC), Group of Advanced Oxidation Processes (GPAO), École Polytechnique Fédérale de Lausanne (EPFL), Station 6, Lausanne, CH-1015, Switzerland; Faculty of Biology and Medicine, Department of Fundamental Microbiology, University of Lausanne (UNIL), Biophore Building, Lausanne, CH-1015, Switzerland
Recommended Citation:
Giannakis S.,Le T.-T.M.,Entenza J.M.,et al. Solar photo-Fenton disinfection of 11 antibiotic-resistant bacteria (ARB) and elimination of representative AR genes. Evidence that antibiotic resistance does not imply resistance to oxidative treatment[J]. Water Research,2018-01-01,143