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Auto-Masked Surface Texturing of Kerf-Loss Free Silicon Wafers Using Hexafluoroisopropanol in a Capacitively Coupled Plasma Etching System [期刊论文]
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2019-01-01, 8 (4) : Q76-Q79
Kim, Suhyun;  Park, Jin-Su;  Kim, Jun-Hyun;  Kim, Chang-Koo;  Kim, Jihyun
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